Sputtering Targets

GESmaterials offers a wide range of high-quality sputtering targets at competitive prices.Our products include pure elements, compounds, and alloys with purities ranging from 99.5% to 99.9999%. The shapes of the targets vary, including round, rectangular, column, and custom shapes based on customer requirements.

GESmaterials specializes in producing custom alloy and ceramic targets to meet the specific needs of our customers.

Sputtering Target Material Names T – Z:

Tantalum(Ta(T))

Tantalum, Ta 
Tantalum Carbide, TaC 
Tantalum Nitride, TaN 
Tantalum Oxide, Ta2O5 
Tantalum Silicide, TaSi2 

Tellurium(Te(T)) 

Tellurium, Te 
Terbium, Tb
Terbium Manganate, TbMnO3 

Tin(Sn(T))

Tin, Sn 
Tin Oxide, SnO2

Titanium(Ti(T)) 

Titanium, Ti 
Titanium Boride, TiB2 
Titanium Carbide, TiC 
Titanium Dioxide, TiO2 
Titanium Disilicide, TiSi2 
Titanium Ferrite, TiFe2O4 
Titanium Monoxide, TiO 
Titanium Nitride, TiN 
Titanium Silicate, Ti0.44Si0.10O

Tungsten(W(T))

Tungsten, W 
Tungsten Carbide, WC 
Tungsten Disilicide, WSi2 
Tungsten Disulfide, WS2 
Tungsten Oxide, WO3 
Tungsten Titanium, W/Ti 

Ytterbium(Yb(T)) 

Ytterbium, Yb 
Ytterbium Oxide, Yb2O3 
Yttrium, Y 
Yttrium Ferrite, Y3Fe5O12 
Yttrium Manganate, YMnO3 
Yttrium Oxide, Y2O3 

Zinc(Zn(T))

Zinc, Zn
Zinc Oxide, ZnO
Zinc Oxide Alumina, ZnO/Al2O3 (2% Standard Doping)
Zinc Oxide doped with Gallium Oxide, ZnO/Ga2O3 95/05 wt% 
Zinc Oxide doped with Magnesium, Zn0.9Mg0.1O 
Zinc Oxide doped with Manganese, ZnO with 0.3 wt% Mn 
Zinc Oxide doped with Manganese, ZnO with 4 wt% Mn 
Zinc Oxide doped with Scandia, ZnO/Sc2O3 98/02 wt%
Zinc Oxide doped with Sodium, Zn0.99Na0.01O 
Zinc Selenide, ZnSe 
Zinc Sulfide, ZnS
Zinc Telluride, ZnTe 

Zirconium(Zr(T))

Zirconium, Zr
Zirconium Carbide, ZrC 
Zirconium Nitride, ZrN 
Zirconium Oxide, ZrO2 (fully stabilized – Y2O3)

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