GESmaterials offers a comprehensive selection of high-quality sputtering targets at competitive prices. Our product range includes pure elements, compounds, and alloys with purities ranging from 99.5% to 99.9999%, catering to diverse industries such as semiconductor manufacturing, thin film deposition, optics, and surface coatings.
We provide sputtering targets in a variety of shapes, including round, rectangular, column, and custom shapes tailored to meet specific customer requirements. Whether you need targets for magnetron sputtering, reactive sputtering, or other deposition processes, our products deliver consistent performance and high deposition efficiency.
Tantalum, Ta
Tantalum Carbide, TaC
Tantalum Nitride, TaN
Tantalum Oxide, Ta2O5
Tantalum Silicide, TaSi2
Tellurium, Te
Terbium, Tb
Terbium Manganate, TbMnO3
Tin, Sn
Tin Oxide, SnO2
Titanium, Ti
Titanium Boride, TiB2
Titanium Carbide, TiC
Titanium Dioxide, TiO2
Titanium Disilicide, TiSi2
Titanium Ferrite, TiFe2O4
Titanium Monoxide, TiO
Titanium Nitride, TiN
Titanium Silicate, Ti0.44Si0.10O
Tungsten, W
Tungsten Carbide, WC
Tungsten Disilicide, WSi2
Tungsten Disulfide, WS2
Tungsten Oxide, WO3
Tungsten Titanium, W/Ti
Ytterbium, Yb
Ytterbium Oxide, Yb2O3
Yttrium, Y
Yttrium Ferrite, Y3Fe5O12
Yttrium Manganate, YMnO3
Yttrium Oxide, Y2O3
Zinc, Zn
Zinc Oxide, ZnO
Zinc Oxide Alumina, ZnO/Al2O3 (2% Standard Doping)
Zinc Oxide doped with Gallium Oxide, ZnO/Ga2O3 95/05 wt%
Zinc Oxide doped with Magnesium, Zn0.9Mg0.1O
Zinc Oxide doped with Manganese, ZnO with 0.3 wt% Mn
Zinc Oxide doped with Manganese, ZnO with 4 wt% Mn
Zinc Oxide doped with Scandia, ZnO/Sc2O3 98/02 wt%
Zinc Oxide doped with Sodium, Zn0.99Na0.01O
Zinc Selenide, ZnSe
Zinc Sulfide, ZnS
Zinc Telluride, ZnTe
Zirconium, Zr
Zirconium Carbide, ZrC
Zirconium Nitride, ZrN
Zirconium Oxide, ZrO2 (fully stabilized – Y2O3)
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